High quality of collimation - Mask Aligner UV-KUB 3
Why light collimation has a greater influence on resolution than light homogeneity for a mask aligner?
Although the homogeneity of the source is important, the resolution depends essentially on the quality of collimation.
A lack of homogeneity can be compensated for by good collimation. The opposite is much less obvious.
The vacuum contact makes it possibly and partially to compensate for a collimation defect but has the major drawback of damaging the masks.
Thanks to its high quality of collimation, maskers and mask aligners UV-KUB 2 and UV-KUB 3 by Kloe enables to obtain divergence angle below 2°, with a resolution better than 1µm and an alignment accuracy of 1µm.
Field of application