UV-KUB 2 - UV-LED masking system

An UV-LED masker with an unrivalled collimation perfomance

The exposure and masking system UV-KUB 2, available in 4" or 6" version, is the first UV-LED masking system available on the international market. The UV-KUB 2 is a compact exposure-masking system equipped with a LED based optical head, collimated and homogeneous.

Its masking function enables to reach resolutions down to 2µm. This system is compatible with any of the most popular photoresists such as AZ series, Shipley series, SU-8 and K-CL series.

Request a quote
image du produit
UV-LED exposure source of masker UV-KUB 2

A new approach of masking

The mask aligner range UV-KUB proposes equipment with different levels of flexibility and functionality, in 4'' or 6'' version, with or without alignment function.

With the UV-LED masker UV-KUB 2, you benefit from the LED technology:

  • a cold UV source, therefore eliminating undesirable thermal effects and offer a perfectly monochromatic illumination.
  • you can operate in continuous or pulse mode
  • lifetime of the LEDs > 10 000h: no particular maintenance needed.

By its hermetic configuration, the exposure-masking UV-KUB 2 is an ideal equipment for your laboratory or clean-room. 

Compact and controlled by touchscreen, the UV-KUB 2 ensures safety through an entirely closed exposure chamber, with both hard or soft contact modes available.

It is a laboratory equipment especially well suited for:

UV-LED soft lithography system

Explanatory diagram of the structure of UV-LED exposure-masking system UV-KUB 2

Unrivalled collimation performance

Kloe company has paid particular attention to the unique and specific optical processing chain based on its broad experience in this field.

High quality collimation system

The UV-LED masker UV-KUB 2 benefits from a high quality collimation system that enables to obtain a homogeneous high resolution over the 4 or 6 inches working surface, depending the version.

The divergence angle of the UV light source is less than 2°

Therefore the achievement of patterns with resolution down to 2µm and with excellent verticality of edges on thick layers is guaranteed.

  • Resolution: 2µm
  • Wavelength: 365nm +/- 5nm
  • Power density​: 35mW/cm² +/- 10%
  • Substrate warm-up during exposure: < 1°C
  • Exposure cycle: between 1s and 1h
  • Number of programmable cycles: 10
  • Dimensions: 260 x 260 x 260mm
  • Weight: 8,2kg / 18lbs
  • Colour touchscreen:  5,7 inches
  • Power supply: 100V/240V - 50Hz/60Hz
  • Consumption: 180W
See also: